Matematičeskoe modelirovanie, Tome 7 (1995) no. 1, pp. 110-117
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V. I. Cherednik; V. M. Treushnikov; A. V. Oleynik; O. A. Usacheva. The code for modelling of the photolithographic process of the protective pattern forming by use of positive photoresistors. Matematičeskoe modelirovanie, Tome 7 (1995) no. 1, pp. 110-117. http://geodesic.mathdoc.fr/item/MM_1995_7_1_a8/
@article{MM_1995_7_1_a8,
author = {V. I. Cherednik and V. M. Treushnikov and A. V. Oleynik and O. A. Usacheva},
title = {The code for modelling of the photolithographic process of the protective pattern forming by use of positive photoresistors},
journal = {Matemati\v{c}eskoe modelirovanie},
pages = {110--117},
year = {1995},
volume = {7},
number = {1},
language = {ru},
url = {http://geodesic.mathdoc.fr/item/MM_1995_7_1_a8/}
}
TY - JOUR
AU - V. I. Cherednik
AU - V. M. Treushnikov
AU - A. V. Oleynik
AU - O. A. Usacheva
TI - The code for modelling of the photolithographic process of the protective pattern forming by use of positive photoresistors
JO - Matematičeskoe modelirovanie
PY - 1995
SP - 110
EP - 117
VL - 7
IS - 1
UR - http://geodesic.mathdoc.fr/item/MM_1995_7_1_a8/
LA - ru
ID - MM_1995_7_1_a8
ER -
%0 Journal Article
%A V. I. Cherednik
%A V. M. Treushnikov
%A A. V. Oleynik
%A O. A. Usacheva
%T The code for modelling of the photolithographic process of the protective pattern forming by use of positive photoresistors
%J Matematičeskoe modelirovanie
%D 1995
%P 110-117
%V 7
%N 1
%U http://geodesic.mathdoc.fr/item/MM_1995_7_1_a8/
%G ru
%F MM_1995_7_1_a8
