Geodesic
The code for modelling of the photolithographic process of the protective pattern forming by use of positive photoresistors
Matematičeskoe modelirovanie, Tome 7 (1995) no. 1, pp. 110-117 Cet article a éte moissonné depuis la source Math-Net.Ru

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     author = {V. I. Cherednik and V. M. Treushnikov and A. V. Oleynik and O. A. Usacheva},
     title = {The code for modelling of the photolithographic process of the protective pattern forming by use of positive photoresistors},
     journal = {Matemati\v{c}eskoe modelirovanie},
     pages = {110--117},
     year = {1995},
     volume = {7},
     number = {1},
     language = {ru},
     url = {http://geodesic.mathdoc.fr/item/MM_1995_7_1_a8/}
}
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V. I. Cherednik; V. M. Treushnikov; A. V. Oleynik; O. A. Usacheva. The code for modelling of the photolithographic process of the protective pattern forming by use of positive photoresistors. Matematičeskoe modelirovanie, Tome 7 (1995) no. 1, pp. 110-117. http://geodesic.mathdoc.fr/item/MM_1995_7_1_a8/