Doklady Akademii Nauk, Tome 134 (1960) no. 1, pp. 121-124
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A. V. Byalobzhesky; V. D. Val'kov. The effects of the semiconductor properties of oxide films on the electrochemical behaviour of metals in. Doklady Akademii Nauk, Tome 134 (1960) no. 1, pp. 121-124. http://geodesic.mathdoc.fr/item/DAN_1960_134_1_a31/
@article{DAN_1960_134_1_a31,
author = {A. V. Byalobzhesky and V. D. Val'kov},
title = {The effects of the semiconductor properties of oxide films on the electrochemical behaviour of metals in},
journal = {Doklady Akademii Nauk},
pages = {121--124},
year = {1960},
volume = {134},
number = {1},
language = {ru},
url = {http://geodesic.mathdoc.fr/item/DAN_1960_134_1_a31/}
}
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AU - A. V. Byalobzhesky
AU - V. D. Val'kov
TI - The effects of the semiconductor properties of oxide films on the electrochemical behaviour of metals in
JO - Doklady Akademii Nauk
PY - 1960
SP - 121
EP - 124
VL - 134
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%T The effects of the semiconductor properties of oxide films on the electrochemical behaviour of metals in
%J Doklady Akademii Nauk
%D 1960
%P 121-124
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%U http://geodesic.mathdoc.fr/item/DAN_1960_134_1_a31/
%G ru
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