Photosensitive matrix based on porous microcrystalline silicon
Vestnik Samarskogo universiteta. Estestvennonaučnaâ seriâ, no. 5 (2011), pp. 115-121

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The article presents the results of experimental researches of optoelectric properties of porous silicon. Layers of porous silicon were formed using electrochemical etching process in water-alcohol solutions of hydrofluoric acid on plates with a pre-established microrelief surface. Evaluation of possibility of using of created structure as the artificial retina component was performed based on the results of the research.
Keywords: porous silicon, electrolytic etching, texturized surface, photosensitivity, artificial retina.
@article{VSGU_2011_5_a12,
     author = {N. V. Latukhina and G. A. Pisarenko and A. V. Volkov and V. A. Kitaeva},
     title = {Photosensitive matrix based on porous microcrystalline silicon},
     journal = {Vestnik Samarskogo universiteta. Estestvennonau\v{c}na\^a seri\^a},
     pages = {115--121},
     publisher = {mathdoc},
     number = {5},
     year = {2011},
     language = {ru},
     url = {http://geodesic.mathdoc.fr/item/VSGU_2011_5_a12/}
}
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N. V. Latukhina; G. A. Pisarenko; A. V. Volkov; V. A. Kitaeva. Photosensitive matrix based on porous microcrystalline silicon. Vestnik Samarskogo universiteta. Estestvennonaučnaâ seriâ, no. 5 (2011), pp. 115-121. http://geodesic.mathdoc.fr/item/VSGU_2011_5_a12/