Surface roughness of thin film atomistic nanometer-size clusters
Numerical methods and programming, Tome 17 (2016) no. 4, pp. 455-459
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An algorithm of surface roughness calculation for the thin film atomistic clusters obtained in numerical experiments is proposed. The algorithm is applied to silicon dioxide films. The thickness of deposited films is up to 70 nm. The deposition process simulation is performed using the classical molecular dynamics method with the DESIL force field developed earlier specially for high-energy deposition simulation. The dependence of surface roughness on the algorithm parameters, the temperature of the substrate, and the energy of deposited silicon atoms is studied.
Keywords:
surface roughness, molecular dynamics, thin films, silicon dioxide structure.
@article{VMP_2016_17_4_a9,
author = {G. F. Grigor'ev and V. B. Sulimov and A. V. Tikhonravov},
title = {Surface roughness of thin film atomistic nanometer-size clusters},
journal = {Numerical methods and programming},
pages = {455--459},
year = {2016},
volume = {17},
number = {4},
language = {ru},
url = {http://geodesic.mathdoc.fr/item/VMP_2016_17_4_a9/}
}
TY - JOUR AU - G. F. Grigor'ev AU - V. B. Sulimov AU - A. V. Tikhonravov TI - Surface roughness of thin film atomistic nanometer-size clusters JO - Numerical methods and programming PY - 2016 SP - 455 EP - 459 VL - 17 IS - 4 UR - http://geodesic.mathdoc.fr/item/VMP_2016_17_4_a9/ LA - ru ID - VMP_2016_17_4_a9 ER -
G. F. Grigor'ev; V. B. Sulimov; A. V. Tikhonravov. Surface roughness of thin film atomistic nanometer-size clusters. Numerical methods and programming, Tome 17 (2016) no. 4, pp. 455-459. http://geodesic.mathdoc.fr/item/VMP_2016_17_4_a9/