Geodesic
High performance modeling of modern deposition processes for optical coating nanotechnology
Numerical methods and programming, Tome 13 (2012) no. 4, pp. 491-496

Voir la notice de l'article provenant de la source Math-Net.Ru

Applicability of the method of molecular dynamics (MD) to the simulation of modern processes of deposition of optical coatings is studied. The choice of physical and technological aspects of deposition processes is explained and the most meaningful parameters of computer simulation are estimated. The first results of MD simulation of silica dioxide film growth are discussed. These results demonstrate good perspectives of high performance modeling of deposition processes.
Keywords: high performance modeling; molecular dynamics; thin films; deposition processes. 
@article{VMP_2012_13_4_a1,
     author = {A. V. Tikhonravov and I. V. Kochikov and T. V. Amochkina and F. V. Grigor'ev and O. A. Kondakova and V. B. Sulimov},
     title = {High performance modeling of modern deposition processes for optical coating nanotechnology},
     journal = {Numerical methods and programming},
     pages = {491--496},
     publisher = {mathdoc},
     volume = {13},
     number = {4},
     year = {2012},
     language = {ru},
     url = {http://geodesic.mathdoc.fr/item/VMP_2012_13_4_a1/}
}
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A. V. Tikhonravov; I. V. Kochikov; T. V. Amochkina; F. V. Grigor'ev; O. A. Kondakova; V. B. Sulimov. High performance modeling of modern deposition processes for optical coating nanotechnology. Numerical methods and programming, Tome 13 (2012) no. 4, pp. 491-496. http://geodesic.mathdoc.fr/item/VMP_2012_13_4_a1/