Geodesic
Phenomenological model of metal coating etching in a gas mixtured plasma
Problemy fiziki, matematiki i tehniki, no. 4 (2023), pp. 69-73.

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A phenomenological model of plasma-chemical etching of an aluminum coating is created, which is the basis of current-carrying microstructures in electronic product technologies, in a gas environment containing partial components BCl$_3$ $c_1 = (50$–$65$ vol.$\%)$, Cl$_2$ $c_2 = (25$–$35$ vol.$\%)$ and N$_2$ $c_3 = (0$–30 vol.$\%)$, at a pressure $P = 150$–$250$ mТоrr, and plasma power density $W = 1,6$–$2,2$ W/sm$^2$.
Keywords: plasma-chemical etching, aluminum interconnects, mathematical modeling of plasma processes. 
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V. V. Emelyanov; A. N. Kupo; V. A. Emelyanov. Phenomenological model of metal coating etching in a gas mixtured plasma. Problemy fiziki, matematiki i tehniki, no. 4 (2023), pp. 69-73. http://geodesic.mathdoc.fr/item/PFMT_2023_4_a11/

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