Geodesic
Aqueous compositions based on nanosized silica particles for chemical-mechanical polishing of silicon wafers
Problemy fiziki, matematiki i tehniki, no. 3 (2014), pp. 26-31

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The method of preparation of suspensions based on nano-sized particles of fumed silica is described. The process and results of chemical-mechanical polishing of silicon wafers carried out in industrial environments are investigated. Recommendations on the use of polishing compositions in the chemical-mechanical polishing are making. When using the polishing suspensions SPS-81M and SPS-55M in the process of single-crystal silicon wafer CMP, high structural perfection and atomic smoothness of the surface roughness are achieved at the level of tenths of a nanometer.
Keywords: chemical-mechanical polishing, fumed silica, nanosized particles, roughness.
Mots-clés : surface 
@article{PFMT_2014_3_a4,
     author = {Ya. A. Kosenok and V. E. Gaishun and O. I. Tyulenkova and V. G. Denisman},
     title = {Aqueous compositions based on nanosized silica particles for chemical-mechanical polishing of silicon wafers},
     journal = {Problemy fiziki, matematiki i tehniki},
     pages = {26--31},
     publisher = {mathdoc},
     number = {3},
     year = {2014},
     language = {ru},
     url = {http://geodesic.mathdoc.fr/item/PFMT_2014_3_a4/}
}
TY  - JOUR
AU  - Ya. A. Kosenok
AU  - V. E. Gaishun
AU  - O. I. Tyulenkova
AU  - V. G. Denisman
TI  - Aqueous compositions based on nanosized silica particles for chemical-mechanical polishing of silicon wafers
JO  - Problemy fiziki, matematiki i tehniki
PY  - 2014
SP  - 26
EP  - 31
IS  - 3
PB  - mathdoc
UR  - http://geodesic.mathdoc.fr/item/PFMT_2014_3_a4/
LA  - ru
ID  - PFMT_2014_3_a4
ER  - 
%0 Journal Article
%A Ya. A. Kosenok
%A V. E. Gaishun
%A O. I. Tyulenkova
%A V. G. Denisman
%T Aqueous compositions based on nanosized silica particles for chemical-mechanical polishing of silicon wafers
%J Problemy fiziki, matematiki i tehniki
%D 2014
%P 26-31
%N 3
%I mathdoc
%U http://geodesic.mathdoc.fr/item/PFMT_2014_3_a4/
%G ru
%F PFMT_2014_3_a4
Ya. A. Kosenok; V. E. Gaishun; O. I. Tyulenkova; V. G. Denisman. Aqueous compositions based on nanosized silica particles for chemical-mechanical polishing of silicon wafers. Problemy fiziki, matematiki i tehniki, no. 3 (2014), pp. 26-31. http://geodesic.mathdoc.fr/item/PFMT_2014_3_a4/