Fabrication and characterization of spectrally selective glazing dielectric multilayer structures
Nanosistemy: fizika, himiâ, matematika, Tome 11 (2020) no. 4, pp. 488-492.

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We report the fabrication of three- and five-layered based TiO$_{2}$/SiO$_{2}$ dielectric structures as the back-end reflector application in thin film silicon solar cells. These dielectric structures are prepared by the combined sol-gel and spin-coating techniques. X-ray diffraction (XRD) analysis of both the three- and five-layered based structures confirmed the anatase phase of TiO$_{2}$ with its dominant peak at 2O=25$^{\circ}$. Field-emission scanning electron microscopy (FESEM) study demonstrated the formation of three and five alternate layers of TiO$_{2}$ and SiO$_{2}$ films. Comparatively, five-layered based reflector yielded the maximum (100 %) reflectance in the near-infrared (NIR) wavelength region as evidenced by the UV-Vis spectroscopy investigation.
Keywords: sol-gel method, thin films, bragg reflectors, dielectric materials.
@article{NANO_2020_11_4_a14,
     author = {Venkatesh Yepuri and R. S. Dubey and Brijesh Kumar},
     title = {Fabrication and characterization of spectrally selective glazing dielectric multilayer structures},
     journal = {Nanosistemy: fizika, himi\^a, matematika},
     pages = {488--492},
     publisher = {mathdoc},
     volume = {11},
     number = {4},
     year = {2020},
     language = {en},
     url = {http://geodesic.mathdoc.fr/item/NANO_2020_11_4_a14/}
}
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Venkatesh Yepuri; R. S. Dubey; Brijesh Kumar. Fabrication and characterization of spectrally selective glazing dielectric multilayer structures. Nanosistemy: fizika, himiâ, matematika, Tome 11 (2020) no. 4, pp. 488-492. http://geodesic.mathdoc.fr/item/NANO_2020_11_4_a14/