Geodesic
Modeling of thin films surface growth
Matematičeskoe modelirovanie, Tome 24 (2012) no. 5, pp. 35-44

Voir la notice de l'article provenant de la source Math-Net.Ru

The paper is devoted to the modeling of thin films surface growth. A short review of existing approaches and models is given. An original model of thin films surface growth is proposed representing stochastic cellular automata and allowing investigation of influence of wafer temperature, deposition rate and time on the morphology parameters of a surface. Comparison simulation results with atomic-force microscopy of experimentally received thin films samples are given.
Keywords: surface growth, thin films, stochastic cellular automata, morphology parameters. 
@article{MM_2012_24_5_a2,
     author = {V. A. Vasil'ev and P. S. Chernov},
     title = {Modeling of thin films surface growth},
     journal = {Matemati\v{c}eskoe modelirovanie},
     pages = {35--44},
     publisher = {mathdoc},
     volume = {24},
     number = {5},
     year = {2012},
     language = {ru},
     url = {http://geodesic.mathdoc.fr/item/MM_2012_24_5_a2/}
}
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V. A. Vasil'ev; P. S. Chernov. Modeling of thin films surface growth. Matematičeskoe modelirovanie, Tome 24 (2012) no. 5, pp. 35-44. http://geodesic.mathdoc.fr/item/MM_2012_24_5_a2/