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Modellinc and optimization of the optical schemes of the photolithography systems
Matematičeskoe modelirovanie, Tome 2 (1990) no. 1, pp. 56-75 Cet article a éte moissonné depuis la source Math-Net.Ru

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On the base of the criteria of image quality the optimization of the aperture of irradiation source in contact lithography systems is performed. Methods of enhancing focus latitude and supression of chromatic aberrarion effects in projection printing are also under investigation. A brief review of perspective technological methods is presented. 
@article{MM_1990_2_1_a5,
     author = {K. A. Valiev and H. Zeyfarth and D. R. Ilkayev and T. M. Makhviladze},
     title = {Modellinc and optimization of the optical schemes of the photolithography systems},
     journal = {Matemati\v{c}eskoe modelirovanie},
     pages = {56--75},
     year = {1990},
     volume = {2},
     number = {1},
     language = {ru},
     url = {http://geodesic.mathdoc.fr/item/MM_1990_2_1_a5/}
}
TY  - JOUR
AU  - K. A. Valiev
AU  - H. Zeyfarth
AU  - D. R. Ilkayev
AU  - T. M. Makhviladze
TI  - Modellinc and optimization of the optical schemes of the photolithography systems
JO  - Matematičeskoe modelirovanie
PY  - 1990
SP  - 56
EP  - 75
VL  - 2
IS  - 1
UR  - http://geodesic.mathdoc.fr/item/MM_1990_2_1_a5/
LA  - ru
ID  - MM_1990_2_1_a5
ER  - 
%0 Journal Article
%A K. A. Valiev
%A H. Zeyfarth
%A D. R. Ilkayev
%A T. M. Makhviladze
%T Modellinc and optimization of the optical schemes of the photolithography systems
%J Matematičeskoe modelirovanie
%D 1990
%P 56-75
%V 2
%N 1
%U http://geodesic.mathdoc.fr/item/MM_1990_2_1_a5/
%G ru
%F MM_1990_2_1_a5
K. A. Valiev; H. Zeyfarth; D. R. Ilkayev; T. M. Makhviladze. Modellinc and optimization of the optical schemes of the photolithography systems. Matematičeskoe modelirovanie, Tome 2 (1990) no. 1, pp. 56-75. http://geodesic.mathdoc.fr/item/MM_1990_2_1_a5/