Geodesic
Modellinc and optimization of the optical schemes of the photolithography systems
Matematičeskoe modelirovanie, Tome 2 (1990) no. 1, pp. 56-75.

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On the base of the criteria of image quality the optimization of the aperture of irradiation source in contact lithography systems is performed. Methods of enhancing focus latitude and supression of chromatic aberrarion effects in projection printing are also under investigation. A brief review of perspective technological methods is presented. 
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     author = {K. A. Valiev and H. Zeyfarth and D. R. Ilkayev and T. M. Makhviladze},
     title = {Modellinc and optimization of the optical schemes of the photolithography systems},
     journal = {Matemati\v{c}eskoe modelirovanie},
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     publisher = {mathdoc},
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K. A. Valiev; H. Zeyfarth; D. R. Ilkayev; T. M. Makhviladze. Modellinc and optimization of the optical schemes of the photolithography systems. Matematičeskoe modelirovanie, Tome 2 (1990) no. 1, pp. 56-75. http://geodesic.mathdoc.fr/item/MM_1990_2_1_a5/