Geodesic
Crystallization of amorphous silicon dioxide films during ion bombardment and subsequent annealing
Doklady Akademii Nauk, Tome 192 (1970) no. 3, pp. 559-561 Cet article a éte moissonné depuis la source Math-Net.Ru

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@article{DAN_1970_192_3_a17,
     author = {P. V. Pavlov and \`E. V. Shitova and E. I. Zorin},
     title = {Crystallization of amorphous silicon dioxide films during ion bombardment and subsequent annealing},
     journal = {Doklady Akademii Nauk},
     pages = {559--561},
     year = {1970},
     volume = {192},
     number = {3},
     language = {ru},
     url = {http://geodesic.mathdoc.fr/item/DAN_1970_192_3_a17/}
}
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P. V. Pavlov; È. V. Shitova; E. I. Zorin. Crystallization of amorphous silicon dioxide films during ion bombardment and subsequent annealing. Doklady Akademii Nauk, Tome 192 (1970) no. 3, pp. 559-561. http://geodesic.mathdoc.fr/item/DAN_1970_192_3_a17/