TY  - JOUR
AU  - V. V. Emelyanov
AU  - A. N. Kupo
AU  - V. A. Emelyanov
TI  - Modeling of plasma-chemical etching of silicon nitride functional layer on silicon dioxide sublayer in microelectronics technologies
JO  - Problemy fiziki, matematiki i tehniki
PY  - 2023
SP  - 60
EP  - 63
IS  - 3
PB  - mathdoc
UR  - http://geodesic.mathdoc.fr/item/PFMT_2023_3_a10/
LA  - ru
ID  - PFMT_2023_3_a10
ER  -