%0 Journal Article
%A V. V. Emelyanov
%A A. N. Kupo
%A V. A. Emelyanov
%T Modeling of plasma-chemical etching of silicon nitride functional layer on silicon dioxide sublayer in microelectronics technologies
%J Problemy fiziki, matematiki i tehniki
%D 2023
%P 60-63
%N 3
%I mathdoc
%U http://geodesic.mathdoc.fr/item/PFMT_2023_3_a10/
%G ru
%F PFMT_2023_3_a10