@article{PFMT_2023_3_a10,
     author = {V. V. Emelyanov and A. N. Kupo and V. A. Emelyanov},
     title = {Modeling of plasma-chemical etching of silicon nitride functional layer on silicon dioxide sublayer in microelectronics technologies},
     journal = {Problemy fiziki, matematiki i tehniki},
     pages = {60--63},
     publisher = {mathdoc},
     number = {3},
     year = {2023},
     language = {ru},
     url = {http://geodesic.mathdoc.fr/item/PFMT_2023_3_a10/}
}