TY  - JOUR
AU  - V. I. Cherednik
AU  - V. M. Treushnikov
AU  - A. V. Oleynik
AU  - O. A. Usacheva
TI  - The code for modelling of the photolithographic process of the protective pattern forming by use of positive photoresistors
JO  - Matematičeskoe modelirovanie
PY  - 1995
SP  - 110
EP  - 117
VL  - 7
IS  - 1
PB  - mathdoc
UR  - http://geodesic.mathdoc.fr/item/MM_1995_7_1_a8/
LA  - ru
ID  - MM_1995_7_1_a8
ER  -