%0 Journal Article
%A V. I. Cherednik
%A V. M. Treushnikov
%A A. V. Oleynik
%A O. A. Usacheva
%T The code for modelling of the photolithographic process of the protective pattern forming by use of positive photoresistors
%J Matematičeskoe modelirovanie
%D 1995
%P 110-117
%V 7
%N 1
%I mathdoc
%U http://geodesic.mathdoc.fr/item/MM_1995_7_1_a8/
%G ru
%F MM_1995_7_1_a8